- 专利标题： APPARATUS AND METHOD FOR PROVIDING ULTRAPURE WATER
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申请号： EP24166918.3申请日： 2018-03-28
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公开(公告)号： EP4371944A3公开(公告)日： 2024-05-29
- 发明人: RYCHEN, Philippe , SALADIN, Dominik , KEAV, Sylvain
- 申请人： Ovivo Inc.
- 申请人地址： CA Montreal, QC H3A 2R7 1010 Sherbrooke Street West Suite 1700
- 专利权人： Ovivo Inc.
- 当前专利权人： Ovivo Inc.
- 当前专利权人地址： CA Montreal, QC H3A 2R7 1010 Sherbrooke Street West Suite 1700
- 代理机构： Patentanwälte Ruff, Wilhelm, Beier, Dauster & Partner mbB
- 分案原申请号： 18164647.2 2018.03.28
- 主分类号： C02F1/32
- IPC分类号： C02F1/32 ; C02F103/04 ; C02F1/70 ; C02F1/42
摘要：
The invention relates to an apparatus for providing ultrapure water, in particular ultrapure water for use in semiconductor fabrication.
This apparatus comprises at least one cylindrical reactor with an inner cylindrical shell, an outer cylindrical shell and a channel-like volume between inner shell and outer shell.
According to the invention
- said inner cylindrical shell houses at least one UV emission device,
- said outer cylindrical shell comprises at least one means for reflecting UV radiation, and
- said channel-like volume is provided for flowing water through the reactor.
This apparatus comprises at least one cylindrical reactor with an inner cylindrical shell, an outer cylindrical shell and a channel-like volume between inner shell and outer shell.
According to the invention
- said inner cylindrical shell houses at least one UV emission device,
- said outer cylindrical shell comprises at least one means for reflecting UV radiation, and
- said channel-like volume is provided for flowing water through the reactor.
公开/授权文献
- EP4371944A2 APPARATUS AND METHOD FOR PROVIDING ULTRAPURE WATER 公开/授权日：2024-05-22
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