- 专利标题： PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING APPARATUS
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申请号： EP22864649.3申请日： 2022-08-31
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公开(公告)号： EP4398684A1公开(公告)日： 2024-07-10
- 发明人: UMEHARA, Motohiro , FUJITA, Wataru , ISHIKAWA, Kazuhiro
- 申请人： Kyocera Corporation
- 申请人地址： JP Kyoto-shi Kyoto 612-8501 6 Takeda Tobadono-cho Fushimi-ku
- 专利权人： Kyocera Corporation
- 当前专利权人： Kyocera Corporation
- 当前专利权人地址： JP Kyoto-shi Kyoto 612-8501 6 Takeda Tobadono-cho Fushimi-ku
- 代理机构： Viering, Jentschura & Partner mbB Patent- und Rechtsanwälte
- 优先权： JP 21141949 2021.08.31
- 国际申请： JP2022032839 2022.08.31
- 国际公布： WO2023033067 2023.03.09
- 主分类号： H05H1/00
- IPC分类号： H05H1/00 ; H01L21/31 ; C23C14/06 ; C23C16/44
摘要：
A plasma-resistant laminate of the present disclosure includes a substrate, a membrane electrode formed on the substrate, and a dielectric layer formed on the membrane electrode, the substrate includes sapphire, the dielectric layer includes an oxide including yttrium, and the membrane electrode is made of an active metal, a constituent element of the substrate or the dielectric layer, or a laminate thereof.
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