- 专利标题: CONTROL DEVICE AND SETTING DEVICE FOR SEWING MACHINE, AND SEWING MACHINE
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申请号: EP22875391.9申请日: 2022-03-16
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公开(公告)号: EP4450693A1公开(公告)日: 2024-10-23
- 发明人: EGAMI Shinko , YOSHIDA Takahiro , YAMASHITA Tatsuya
- 申请人: TISM Co., LTD.
- 申请人地址: JP Kasugai-shi, Aichi 486-0901 1800 Ushiyama-cho
- 代理机构: Kehl, Ascherl, Liebhoff & Ettmayr Patentanwälte Partnerschaft mbB
- 优先权: JP2021161557 20210930
- 国际公布: WO2023053508 20230406
- 主分类号: D05B19/12
- IPC分类号: D05B19/12 ; D05B69/00 ; D05C5/02
摘要:
The present invention aims to variably set control conditions for avoiding a hitch stitch. By a program executed by a CPU (101), a determination is made as to whether a direction in which a next stitch is to be formed belongs to a predetermined area corresponding to a hitch stitch, and upon determination that the direction in which the next stitch is to be formed belongs to the predetermined area, detour control is performed which includes moving a holding member (5), holding a sewing workpiece, so as to detuor an upper thread, extending downward from a sewing needle, in a direction corresponding to a perfect stitch and then further moving the holding member to a target position corresponding to the next stitch. Various conditions for the detour control are variably set via an operation panel (6) and a program executed by the CPU (101) (setting means). Such variable setting can be done by user's operations via the operation panel (6), by setting detour-controlling data incorporated in sewing pattern program data, and/or the like. The conditions for the detour control include enabling execution of the detour control and variably setting a range of the predetermined area.
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