- 专利标题： Photosensitive resin composition, color filter and a method for producing the same, as well as, the solid-state imaging device
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申请号： JP2008213260申请日： 2008-08-21
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公开(公告)号： JP5274151B2公开(公告)日： 2013-08-28
- 发明人: 英希 高桑 , 薫 青柳 , 和人 嶋田
- 申请人： 富士フイルム株式会社
- 专利权人： 富士フイルム株式会社
- 当前专利权人： 富士フイルム株式会社
- 优先权： JP2008213260 2008-08-21
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G02B5/20 ; G02F1/1335 ; G03F7/027 ; G03F7/031 ; G03F7/40 ; H01L27/14
摘要：
A photosensitive resin composition is provided which provides a high resolution even when a pattern is formed using a low exposure intensity (in particular, less than 200 mJ/cm 2 ) and may inhibit deterioration in pattern rectangularity during a post baking process of a post treatment. The photosensitive resin composition includes: a resin; an oxime photopolymerization initiator; a UV absorbing agent; and a monomer containing a hydrogen bonding group, the amount of the monomer containing a hydrogen bonding group being 30 mass% or more with respect to the total solid content of the composition, and the photosensitive resin composition is used for forming a solid-state imaging device.
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