Providing a developing property, heat resistance and novolac resin and a resist film excellent in dry etching resistance. The following structural formula (1)

[Wherein α is represented by the following general formula (2)

In a structure represented by sites (alpha), n is an integer from 2 to 10. ]
In containing cyclic novolac resin (A) having a molecular structure represented, at least one tertiary alkyl group of X present in the resin, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, novolak type resin which is characterized in that either a trialkylsilyl group.