Aqueous pH of at least one organic stripping solvent, pK value of the non-nucleophilic least one parent amine and aqueous solution of 2.0 or greater and less than the equivalent weight of 140, a stripping composition from about 9.6 to about 10.9 so that about 3% by weight to about a nucleophilic amine 75 one or more in an amount sufficient to neutralize the weight% of nitrogen-free weak acids, diethylene glycol and diethylene glycol, at least one metal selected from the group consisting of amine-removing compound, and comprising water, cleaning microelectronics substrates stripping and cleaning composition and method for cleaning a microelectronics substrate with the composition for. Organic stripping solvent, a nucleophilic amine, a nitrogen-free weak acids, metal-removing compound, the microelectronics substrate, stripping compositions, cleaning compositions