发明公开
- 专利标题： 폭에 걸친 온도 분포에 영향을 주기 위한 장치
- 专利标题（英）： Device for influencing the temperature distribution over a width
- 专利标题（中）： 影响温度分布的装置
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申请号： KR1020097018836申请日： 2008-04-03
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公开(公告)号： KR1020090130234A公开(公告)日： 2009-12-21
- 发明人: 바움괴르텔우베 , 자이델쥐르겐
- 申请人： 에스엠에스 그룹 게엠베하
- 申请人地址： Eduard Schloemann-Strasse *, Dusseldorf, Germany
- 专利权人： 에스엠에스 그룹 게엠베하
- 当前专利权人： 에스엠에스 그룹 게엠베하
- 当前专利权人地址： Eduard Schloemann-Strasse *, Dusseldorf, Germany
- 代理商 송봉식; 정삼영
- 优先权： DE10 2007 025 2872 2007-05-30; DE10 2007 026 5788 2007-06-08; DE10 2007 053 5238 2007-11-09
- 国际申请： PCT/EP2008/002643 2008-04-03
- 国际公布： WO2008145222 2008-12-04
- 主分类号： B21B45/02
- IPC分类号： B21B45/02 ; B21B37/72 ; B21B37/44
摘要：
The invention relates to a device (10) for influencing the temperature distribution over the width of a rolled material and/or a strip (11) or a slab, particularly in a hot strip mill, wherein at least one cooling device is provided and has nozzles (14) for applying a cooling means, wherein the nozzles (14) are arranged in such a manner or are controlled such that a cooling means is applied particularly to positions at which an increased temperature is detected. Furthermore, the invention relates to a device (10) for influencing the strip surface evenness by strip cooling, wherein according to the surface evenness of the strip (11), the cooling device is controlled in such a manner that the uneven areas are reduced or removed. In addition, with this invention the strip contour can be influenced in a specific manner, wherein the strip (11) or the slab is cooled over the width thereof in such a manner that the strip contour better approximates a desired target contour.
公开/授权文献
- KR101138725B1 폭에 걸친 온도 분포에 영향을 주기 위한 장치 公开/授权日：2012-04-25
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