Invention Publication
KR1020130046373A 임프린트 장치, 임프린트 방법, 임프린트 시스템, 및 소자 제조 방법
无效 - Rejected
IMPRINT APPARATUS，IMPRINT METHOD，IMPRINT SYSTEM，AND DEVICE MANUFACTURING METHOD
- Patent Title: 임프린트 장치, 임프린트 방법, 임프린트 시스템, 및 소자 제조 방법
- Patent Title (English): Imprint apparatus, imprint method, imprint system, and device manufacturing method
- Patent Title (中): IMPRINT APPARATUS，IMPRINT METHOD，IMPRINT SYSTEM，AND DEVICE MANUFACTURING METHOD
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Application No.: KR1020120119487Application Date: 2012-10-26
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Publication No.: KR1020130046373APublication Date: 2013-05-07
- Inventor: 이이무라아키코 , 스즈키아키요시
- Applicant: 캐논 가부시끼가이샤
- Applicant Address: **-*, Shimomaruko *-chome, Ohta-ku, Tokyo, Japan
- Assignee: 캐논 가부시끼가이샤
- Current Assignee: 캐논 가부시끼가이샤
- Current Assignee Address: **-*, Shimomaruko *-chome, Ohta-ku, Tokyo, Japan
- Agent 장수길; 박충범
- Priority: JPJP-P-2011-236378 2011-10-27
- Main IPC: B29C59/02
- IPC: B29C59/02 ; B29C33/42 ; B29C43/50 ; H01L21/027
Abstract:
PURPOSE: An imprint device, an imprinting method, an imprinting system, and a method for manufacturing the device are provided to prevent a substrate from forming using a damaged mold and to minimize the number of the substrates reduced for maintenance and repair. CONSTITUTION: An imprint device(100) comprises a radiating unit, a detecting unit(200), and a mold maintaining unit(130). The radiating unit radiates excitation light for irradiating a luminescent material. The mold maintaining unit is formed to maintain a mold including the luminescent material. A pattern is transferred to an imprint material, the radiating unit radiates the excitation light to the pattern. The detecting unit detects the light radiated from the luminescent material remains in the imprint material.
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