提供一种即使防止起因于水份从裂痕侵入的金属配线端面的腐蚀,或者金属配线端面产生腐蚀的情形下,也能防止该腐蚀到达构成驱动液晶显示设备之液晶显示部分的闸极线等之金属配线的技术。本发明系有关一种配线构造,针对在基板之上具有于同一平面上形成有复数金属配线,且在金属配线之上形成有绝缘膜的层积构成,且具有利用切割加工露出切断端面之第一金属配线的配线构造,其特征为:当第一金属配线的线宽为X(���m)、第一金属配线的长度为Y(���m)时,满足(1)或(2)及/或下述(3)之要件;当(1)X≦20���m、(2)X>20���m时,Y≧10X-160,(3)在第一金属配线之切断端面至邻接于第一金属配线的第二金属配线之间,第一金属配线具有绝缘膜不存在的区域Z。又,本发明是有关一种配线构造,为一种在基板上具有利用切割加工露出切断端面的第一金属配线、第二金属配线、和绝缘膜的显示设备用配线构造,前述第一金属配线系具有100���m以上的不连续部,因前述不连续部而分断的各第一金属配线,系因第二金属配线而链接,前述被分断的第一金属配线和前述第二金属配线的接触界面的至少一方,系具有比构成前述第一金属配线或前述第二金属配线的金属微贵的金属的腐蚀防止层为其特征。

Disclosed is an interconnect structure which has, on a substrate, a laminate structure in which a plurality of metal lines is formed on the same plane and an insulating film is formed on the metal lines, and has a first metal lines the cut edge of which is exposed by cut processing. If the line width of the first metal lines is defined as X, and the length of the first metal lines is defined as Y, the following requirements (1) or (2), and/or (3) are satisfied: (1) X=20 &mgr; m, (2) when X> 20 &mgr; m, Y=10X-160 &mgr; m, (3) the first metal lines have a region of no insulating film (Z) from the cut edge of the first metal lines to the second metal lines adjacent to the first metal lines. Alternatively, disclosed is an interconnect structure for a display device which has on a substrate first metal lines the cut edge of which is exposed by cut processing, second metal lines, and an insulating film, wherein the first metal lines has a 100 &mgr; m or more discontinuous part, and the first metal lines divided by the discontinuous part are connected by the second metal lines, and at least one contact interface between the divided first metal lines and the second metal lines comprises a corrosion prevention layer, which includes more noble metal than the metal constituting the first metal lines or the second metal lines.