Invention Grant
- Patent Title: Pellicle film including graphite-containing thin film for extreme ultraviolet lithography
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Application No.: US15034014Application Date: 2014-06-03
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Publication No.: US10001700B2Publication Date: 2018-06-19
- Inventor: Mun Ja Kim , Ji-beom Yoo , Seul-gi Kim , Sang-jin Cho , Myung-shik Chang , Jang-dong You
- Applicant: Samsung Electronics Co., Ltd. , Research & Business Foundation SUNGKYUNKWAN UNIVERSITY , Fine Semitech Co., Ltd.
- Applicant Address: KR Gyeonggi-do KR Gyeonggi-do KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.,Research & Business Foundation Sungkyunkwan University,Fine Semitech Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.,Research & Business Foundation Sungkyunkwan University,Fine Semitech Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do KR Gyeonggi-do KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2013-0157275 20131217
- International Application: PCT/KR2014/004941 WO 20140603
- International Announcement: WO2015/093699 WO 20150625
- Main IPC: G03F1/22
- IPC: G03F1/22 ; G03F1/62 ; G03F1/64
Abstract:
A pellicle film for extreme ultraviolet (EUV) lithography includes a graphite-containing thin film.
Public/Granted literature
- US20160282712A1 PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY Public/Granted day:2016-09-29
Information query
