- 专利标题: Active device and method for manufacturing active device
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申请号: US15542910申请日: 2016-08-04
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公开(公告)号: US10008604B2公开(公告)日: 2018-06-26
- 发明人: Hideaki Nada
- 申请人: NISSHA PRINTING CO., LTD.
- 申请人地址: JP Kyoto
- 专利权人: NISSHA PRINTING CO., LTD.
- 当前专利权人: NISSHA PRINTING CO., LTD.
- 当前专利权人地址: JP Kyoto
- 代理机构: Rankin, Hill & Clark LLP
- 优先权: JP2015-173331 20150902
- 国际申请: PCT/JP2016/072945 WO 20160804
- 国际公布: WO2017/038372 WO 20170309
- 主分类号: H01L35/24
- IPC分类号: H01L35/24 ; H01L51/00 ; H01L21/00 ; H01L21/84 ; H01L29/786 ; H01L51/10
摘要:
[Object]The present invention provides an active device in which the misalignment of a partition relative to electrodes is reduced and a method for manufacturing an active device.[Solution]An active device according to the present invention includes a substrate 2, a first electrode 5 and a second electrode 6 formed adjacent to each other on one main surface of the substrate 2, an organic semiconductor layer 9 formed on the one main surface of the substrate 2 at least over a region between the first electrode 5 and the second electrode 6, and a partition 12 formed on the one main surface of the substrate 2 in a region that is located outside the organic semiconductor layer 9 in a planar direction and that is different from regions where the first electrode 5 and the second electrode 6 are formed. The partition 12 is formed of a conductive material.
公开/授权文献
- US20180090609A1 ACTIVE DEVICE AND METHOD FOR MANUFACTURING ACTIVE DEVICE 公开/授权日:2018-03-29
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