- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
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Application No.: US15176810Application Date: 2016-06-08
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Publication No.: US10011576B2Publication Date: 2018-07-03
- Inventor: Shuhei Yamaguchi , Koutarou Takahashi , Tomotaka Tsuchimura , Natsumi Yokokawa , Hidehiro Mochizuki
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-028890 20140218
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; G03F7/20 ; G03F7/32 ; C07D307/33 ; C08F12/24 ; C08F112/14 ; C08F212/32 ; G03F7/038 ; C08F212/14 ; C09D125/18 ; G03F1/50 ; C08F12/22
Abstract:
The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.
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