Invention Grant
- Patent Title: Developing apparatus
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Application No.: US15504949Application Date: 2015-09-03
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Publication No.: US10012928B2Publication Date: 2018-07-03
- Inventor: Naoya Iwata
- Applicant: S-Printing Solution Co., Ltd.
- Applicant Address: KR Suwon-Si
- Assignee: S-PRINTING SOLUTION CO., LTD.
- Current Assignee: S-PRINTING SOLUTION CO., LTD.
- Current Assignee Address: KR Suwon-Si
- Agency: Staas & Halsey LLP
- Priority: JP2014-179451 20140903; JP2015-166599 20150826
- International Application: PCT/KR2015/009302 WO 20150903
- International Announcement: WO2016/036164 WO 20160310
- Main IPC: G03G15/08
- IPC: G03G15/08

Abstract:
A developing apparatus capable of suppressing an excessive discharge of developer from a developer discharge hole is disclosed. A first opening part through which developer is carried from a first case part to a second case part, and a developer discharge hole through which the developer is discharged are provided to the first case part. A first carrying member includes a counter blade between the first opening part and the developer discharge hole. The counter blade carries the developer in an opposite direction to a carrying direction of a first carrying blade of the first carrying member. A gap is prepared between an upper part of the counter blade and the first case part. A cross-sectional area of a discharge path for the developer from the counter blade to the developer discharge hole changes according to a progress of the developer along the discharge path.
Public/Granted literature
- US20170248868A1 DEVELOPING APPARATUS Public/Granted day:2017-08-31
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