Invention Grant
- Patent Title: Optical semiconductor device and method for making the device
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Application No.: US15452543Application Date: 2017-03-07
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Publication No.: US10014437B2Publication Date: 2018-07-03
- Inventor: Hugo Bender , Yang Qiu
- Applicant: IMEC VZW , Katholieke Universiteit Leuven, KU Leuven R&D
- Applicant Address: BE Leuven BE Leuven
- Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU Leuven R&D
- Current Assignee: IMEC VZW,Katholieke Universiteit Leuven, KU Leuven R&D
- Current Assignee Address: BE Leuven BE Leuven
- Agency: Knobbe Martens Olson & Bear, LLP
- Priority: EP15160994 20150326
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L29/06 ; H01L33/18 ; H01L33/34 ; H01L31/036 ; H01L31/18 ; H01L33/28 ; H01L33/08 ; H01L31/028 ; H01L31/0352 ; H01L33/24 ; H01L21/02 ; H01L21/762

Abstract:
An optical semiconductor device comprises, on a substrate, a fin of diamond-cubic semiconductor material and, at the base of the fin, a slab of that semiconductor material, in a diamond-hexagonal structure, that extends over the full width of the fin, the slab being configured as an optically active material. This semiconductor material can contain silicon. A method for manufacturing the optical semiconductor device comprises annealing the sidewalls of the fin, thereby inducing a stress gradient along the width of the fin.
Public/Granted literature
- US20170179337A1 OPTICAL SEMICONDUCTOR DEVICE AND METHOD FOR MAKING THE DEVICE Public/Granted day:2017-06-22
Information query
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