- 专利标题： System and method for providing an electron blocking layer with doping control
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申请号： US15215968申请日： 2016-07-21
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公开(公告)号： US10014439B2公开(公告)日： 2018-07-03
- 发明人: Joseph M. Freund , John M. DeLucca
- 申请人： Avago Technologies General IP (Singapore) Pte. Ltd.
- 申请人地址： SG Singapore
- 专利权人： AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
- 当前专利权人： AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
- 当前专利权人地址： SG Singapore
- 代理机构： Sheridan Ross P.C.
- 主分类号： H01L33/14
- IPC分类号： H01L33/14 ; H01L21/02 ; H01L21/22 ; H01L29/15
摘要：
Aspects of the disclosure pertain to a system and method for providing an electron blocking layer with doping control. The electron blocking layer is included in a semiconductor assembly. The electron blocking layer includes a lithium aluminate layer. The lithium aluminate layer promotes reduced diffusion of magnesium into a layer stack of the semiconductor assembly.
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