Invention Grant
- Patent Title: Device and method for measuring concentration of etchant
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Application No.: US14359576Application Date: 2014-03-28
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Publication No.: US10018555B2Publication Date: 2018-07-10
- Inventor: Rui Xu , Weiwei Zhang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen
- Priority: CN201410091097 20140312
- International Application: PCT/CN2014/074265 WO 20140328
- International Announcement: WO2015/135230 WO 20150917
- Main IPC: G01N21/31
- IPC: G01N21/31

Abstract:
A device and method for measuring concentration of etchant, the device comprises a concentration measuring mechanism and an acid mist elimination mechanism connected with the concentration measuring mechanism, the acid mist elimination mechanism is configured to eliminate acid mist inside the concentration measuring mechanism, and the concentration measuring mechanism is configured to receive etchant in real time, measure absorbance of each kind of acid of the etchant in a non-acid mist environment, and calculate concentration of each kind of acid of the etchant according to the absorbance. It can overcome the interference of the acid mist on concentration measurement of the acid of the acid mixture etchant. In this way, the concentration of each kind of acid of the acid mixture etchant can be online measured rapidly and accurately, and the desiccative gas can be recycled, which achieves the effect of resource conservation.
Public/Granted literature
- US20150260651A1 DEVICE AND METHOD FOR MEASURING CONCENTRATION OF ETCHANT Public/Granted day:2015-09-17
Information query
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