- Patent Title: Alignment system and extreme ultraviolet light generation system
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Application No.: US15076977Application Date: 2016-03-22
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Publication No.: US10027084B2Publication Date: 2018-07-17
- Inventor: Masato Moriya , Osamu Wakabayashi
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JP2011-224213 20111011
- Main IPC: B23K26/04
- IPC: B23K26/04 ; H01S3/101 ; H05G2/00 ; H01S3/23 ; H01S3/00

Abstract:
An alignment system for a laser apparatus includes a guide laser device outputting a guide laser beam, an adjusting mechanism adjusting travel directions of the guide laser beam and a laser beam from the laser apparatus, a beam path combiner controlling travel directions of the laser beam and the guide laser beam to substantially coincide with each other, a first optical detection unit provided from the beam path combiner detecting the laser and guide laser beams, a first controller controlling the adjusting mechanism based on a first optical detection unit detection result, a beam steering unit downstream from the beam path combiner controlling travel directions of the laser and guide laser beams, a second optical detection unit downstream from the beam steering unit detecting the guide laser beam, and a second controller controlling the beam steering unit based on a second optical detection unit detection result.
Public/Granted literature
- US20160204567A1 ALIGNMENT SYSTEM AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM Public/Granted day:2016-07-14
Information query
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