- 专利标题: Treatment apparatus using high frequency waves and method for controlling same
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申请号: US15664522申请日: 2017-07-31
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公开(公告)号: US10035024B2公开(公告)日: 2018-07-31
- 发明人: Kwang Chon Ko
- 申请人: Lutronic Corporation
- 申请人地址: KR Gyeonggi-do
- 专利权人: Lutronic Corporation
- 当前专利权人: Lutronic Corporation
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: McCarter & English, LLP
- 代理商 Steven G. Davis; David R. Burns
- 优先权: KR10-2011-0074202 20110726
- 主分类号: A61N1/00
- IPC分类号: A61N1/00 ; A61B5/02 ; A61N1/40 ; A61H99/00 ; A61B18/14 ; A61B5/00 ; A61B5/053 ; A61N1/32 ; A61N1/06 ; A61B18/00 ; A61H39/00
摘要:
The present invention relates to a treatment apparatus using high frequency waves, and to a method for controlling same. The treatment apparatus using high frequency waves comprises: a high frequency wave generating unit; a plurality of needles for providing, into the skin of a user, high frequency energy transferred from the high frequency wave generating unit; and a driving unit for inserting the plurality of needles into the skin of the user, wherein the apparatus further comprises a control unit for controlling the driving unit such that the plurality of needles are inserted into a first target point within the skin and then move to a second target point.
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