- 专利标题: Stage apparatus, lithography apparatus, and device manufacturing method
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申请号: US14224316申请日: 2014-03-25
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公开(公告)号: US10036965B2公开(公告)日: 2018-07-31
- 发明人: Masanori Yamada
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 代理机构: Rossi, Kimms & McDowell LLP
- 优先权: JP2013-064918 20130326
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A stage apparatus includes: a coarse moving stage; a fine moving stage located at an interval from the coarse moving stage in a first direction; an electromagnetic actuator including a first core located on one of the coarse moving stage and the fine moving stage and a second core located on the other of the coarse moving stage and the fine moving stage and configured to accelerate or decelerate the fine moving stage in a second direction perpendicular to the first direction; and a controller configured to correct a command value of a thrust of the electromagnetic actuator in the second direction in accordance with a relative position of the fine moving stage with respect to the coarse moving stage in the first direction.
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