Invention Grant
- Patent Title: One transistor and one resistive random access memory (RRAM) structure with spacer
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Application No.: US15144639Application Date: 2016-05-02
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Publication No.: US10038139B2Publication Date: 2018-07-31
- Inventor: Hsia-Wei Chen , Wen-Ting Chu , Kuo-Chi Tu , Chin-Chieh Yang , Chih-Yang Chang , Yu-Wen Liao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L21/20 ; H01L45/00 ; H01L27/24

Abstract:
The present disclosure provides a resistive random access memory (RRAM) cells and methods of making the same. The RRAM cell includes a transistor and an RRAM structure. The RRAM structure includes a bottom electrode having a via portion and a top portion, a resistive material layer on the bottom electrode having a width that is same as a width of the top portion of the bottom electrode; a capping layer over the bottom electrode; a spacer surrounding the capping layer; and, a top electrode on the capping layer having a smaller width than the resistive material layer. The RRAM cell further includes a conductive material connecting the top electrode of the RRAM structure to a metal layer.
Public/Granted literature
- US20160248008A1 One Transistor and One Resistive Random Access Memory (RRAM) Structure with Spacer Public/Granted day:2016-08-25
Information query
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