Invention Grant
- Patent Title: Polyimide film having a low dielectric constant and a low gloss, and method of fabricating the same
-
Application No.: US14697185Application Date: 2015-04-27
-
Publication No.: US10040939B2Publication Date: 2018-08-07
- Inventor: Chun-Ting Lai , Chih-Wei Lin
- Applicant: TAIMIDE TECHNOLOGY INCORPORATION
- Applicant Address: TW Hsinchu County
- Assignee: Taimide Technology Incorporation
- Current Assignee: Taimide Technology Incorporation
- Current Assignee Address: TW Hsinchu County
- Agency: Baker & McKenzie LLP
- Priority: TW103115180A 20140428
- Main IPC: C08L79/08
- IPC: C08L79/08 ; C08J5/18 ; C09D179/08 ; C08G73/10
Abstract:
A polyimide film includes a polyimide, a carbon black present in a quantity between about 0.5 wt % and about 5 wt %, and a fluorine-containing polymer present in a quantity between about 15 wt % and about 40 wt %. The polyimide film can be a single-layer film or a multi-layer film, and has a low dielectric constant and low gloss.
Public/Granted literature
- US20150307709A1 POLYIMIDE FILM HAVING A LOW DIELECTRIC CONSTANT AND A LOW GLOSS, AND METHOD OF FABRICATING THE SAME Public/Granted day:2015-10-29
Information query
