Invention Grant
- Patent Title: CW DUV laser with improved stability
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Application No.: US15335266Application Date: 2016-10-26
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Publication No.: US10044166B2Publication Date: 2018-08-07
- Inventor: Yung-Ho Chuang , Xiaoxu Lu , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: H01S3/109
- IPC: H01S3/109 ; G02F1/355 ; H01S3/00 ; G02F1/35

Abstract:
A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.
Public/Granted literature
- US20170070025A1 CW DUV Laser With Improved Stability Public/Granted day:2017-03-09
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