发明授权
- 专利标题： Photo-imprinting resin composition, photo-imprinting resin film and patterning process
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申请号： US15085569申请日： 2016-03-30
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公开(公告)号： US10048582B2公开(公告)日： 2018-08-14
- 发明人: Yaw-Ting Wu , Ping-Chen Chen
- 申请人： Industrial Technology Research Institute
- 申请人地址： TW Hsinchu
- 专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： TW Hsinchu
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： TW104142230A 20151216
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; C09D133/14 ; C09D133/16 ; C08L63/04
摘要：
A photo-imprinting resin composition, a photo-imprinting resin film and a patterning process are provided. The photo-imprinting resin composition includes a novolac resin; a monomer having acrylic group, a polymer having acrylic group or a combination thereof; and a radical type photopolymerization initiator. The novolac resin has a Mw of 500 to 50000. The novolac resin does not react with the monomer having acrylic group nor the polymer having acrylic group described above.
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