- Patent Title: Method of determining a position of a substrate in a lithography system, substrate for use in such a method, and lithography system for carrying out such method
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Application No.: US14630678Application Date: 2015-02-25
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Publication No.: US10054863B2Publication Date: 2018-08-21
- Inventor: Guido De Boer , Niels Vergeer
- Applicant: MAPPER LITHOGRAPHY IP B.V.
- Applicant Address: NL Delft
- Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee: MAPPER LITHOGRAPHY IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Rokh Monegier LLP
- Agent David P. Owen
- Main IPC: G03F9/00
- IPC: G03F9/00 ; B82Y40/00 ; H01J37/317 ; H01J37/04 ; B82Y10/00 ; H01J37/304

Abstract:
The invention relates to a substrate comprising an optical position mark for being read-out by an optical recording head for emitting light of predetermined wavelength, preferably red or infra-red light, more in particular of 635 nm light, the optical position mark having a mark height, a mark length and a predetermined known position on the substrate, the optical position mark extending along a longitudinal direction and being arranged for varying a reflection coefficient of the position mark along said longitudinal direction, wherein the optical position mark comprises: a first region having a first reflection coefficient and a first width; a second region neighboring the first region and forming a first region pair, the second region having a second reflection coefficient and a second width, and the second reflection coefficient being different from the first reflection coefficient, wherein the first region comprises sub-wavelength structures in comparison with a wavelength of the predetermined wavelength light.
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