Invention Grant
- Patent Title: Non-volatile semiconductor memory device
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Application No.: US15452178Application Date: 2017-03-07
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Publication No.: US10056150B2Publication Date: 2018-08-21
- Inventor: Keiji Ikeda , Chika Tanaka , Toshinori Numata , Tsutomu Tezuka
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Minato-ku
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-183295 20160920
- Main IPC: G11C11/34
- IPC: G11C11/34 ; G11C16/24 ; H01L27/11519 ; H01L27/11565 ; H01L27/11524 ; H01L27/1157 ; H01L27/11556 ; H01L27/11582 ; G11C16/04

Abstract:
According to one embodiment, a non-volatile semiconductor memory device is disclosed. The device includes a semiconductor substrate, and a memory cell array provided on the semiconductor substrate. The memory cell array includes a plurality of memory transistors which are electrically rewritable and arranged in a three-dimensional manner. The device further includes a latch provided above the semiconductor substrate and configured to hold data that is to be written in the memory cell array. The latch includes a capacitor and a first field-effect transistor which is connected to the capacitor and includes a first oxide semiconductor layer.
Public/Granted literature
- US20180082750A1 NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2018-03-22
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