Invention Grant
- Patent Title: Extreme ultraviolet light generation system and method of generating extreme ultraviolet light
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Application No.: US15430737Application Date: 2017-02-13
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Publication No.: US10057972B2Publication Date: 2018-08-21
- Inventor: Yoshifumi Ueno , Hirokazu Hosoda , Takayuki Yabu
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: H05G2/00
- IPC: H05G2/00 ; H01L21/027 ; H05H1/24 ; H01S3/10 ; H05H15/00 ; G03F7/20

Abstract:
An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.
Public/Granted literature
- US20170171955A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT Public/Granted day:2017-06-15
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