- 专利标题: Silver-coated copper alloy powder and method for producing same
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申请号: US14372789申请日: 2013-01-15
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公开(公告)号: US10062473B2公开(公告)日: 2018-08-28
- 发明人: Kenichi Inoue , Kozo Ogi , Atsushi Ebara , Yuto Hiyama , Takahiro Yamada , Toshihiko Ueyama
- 申请人: DOWA ELECTRONICS MATERIALS CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: Dowa Electronics Materials Co., Ltd.
- 当前专利权人: Dowa Electronics Materials Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Bachman & LaPointe, PC
- 优先权: JP2012-006886 20120117; JP2012-120360 20120528
- 国际申请: PCT/JP2013/051019 WO 20130115
- 国际公布: WO2013/108916 WO 20130725
- 主分类号: H01B1/22
- IPC分类号: H01B1/22 ; B22F1/02 ; C22C9/00 ; C22C9/04 ; C22C9/06 ; H01B1/02 ; B22F1/00 ; C22C1/04 ; C22C5/06 ; B22F9/08
摘要:
A silver-coated copper alloy powder, which has a low volume resistivity and excellent storage stability (reliability), is produced by coating a copper alloy powder, which has a chemical composition comprising 1 to 50 wt % of at least one of nickel and zinc and the balance being copper and unavoidable impurities (preferably a copper alloy powder wherein a particle diameter (D50 diameter) corresponding to 50% of accumulation in cumulative distribution of the copper alloy powder, which is measured by a laser diffraction particle size analyzer, is 0.1 to 15 μm), with 7 to 50 wt % of a silver containing layer, preferably a layer of silver or an silver compound.
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