Invention Grant
- Patent Title: IC structure on two sides of substrate and method of forming
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Application No.: US15239976Application Date: 2016-08-18
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Publication No.: US10068899B2Publication Date: 2018-09-04
- Inventor: Ian D. W. Melville , Mukta G. Farooq
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Hoffman Warnick LLC
- Agent Yuanmin Cai
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L21/768 ; H01L23/48 ; H01L25/065 ; H01L25/00

Abstract:
An integrated circuit (IC) structure uses a single semiconductor substrate having a first side and an opposing, second side. A first plurality of active devices are positioned on the first side of the single semiconductor substrate, and a second plurality of active devices are positioned on the opposing, second side of the single semiconductor substrate. A TSV may electrically couple active devices on either side. Use of a single semiconductor substrate with active devices on both sides reduces the number of semiconductor layers used and allows annealing without damaging BEOL interconnects during fabrication.
Public/Granted literature
- US20180053743A1 IC STRUCTURE ON TWO SIDES OF SUBSTRATE AND METHOD OF FORMING Public/Granted day:2018-02-22
Information query
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