Invention Grant
- Patent Title: Surface-treated copper foil
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Application No.: US14388838Application Date: 2013-03-29
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Publication No.: US10070521B2Publication Date: 2018-09-04
- Inventor: Ryo Fukuchi
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Marshall, Gerstein & Borun LLP
- Priority: JP2012-076710 20120329
- International Application: PCT/JP2013/059454 WO 20130329
- International Announcement: WO2013/147115 WO 20131003
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K1/03 ; H05K1/02 ; C23C28/00 ; C23C30/00 ; B32B15/04 ; C23C22/24 ; C23C22/83 ; H05K3/38

Abstract:
This surface-treated copper foil is characterized in that the amount of adhesion of Si on the copper foil surface is from 3.1 to 300 μg/dm2, and the amount of adhesion of N on the copper foil surface is from 2.5 to 690 μg/dm2. The objective of the present invention is to obtain a copper foil having improved peel strength in providing a copper foil for a flexible printed substrate (FPC), in which a copper foil is laminated to a liquid crystal polymer (LCP) suitable for high-frequency applications.
Public/Granted literature
- US20150079415A1 Surface-Treated Copper Foil Public/Granted day:2015-03-19
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