Invention Grant
- Patent Title: Maskless lithography for web based processing
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Application No.: US15026810Application Date: 2014-09-25
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Publication No.: US10073350B2Publication Date: 2018-09-11
- Inventor: Christopher Dennis Bencher
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- International Application: PCT/US2014/057348 WO 20140925
- International Announcement: WO2015/060983 WO 20150430
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G03F7/24 ; G03F9/00
Abstract:
The present disclosure generally relates to a method and apparatus for processing a web-based substrate. As the substrate travels between rollers, the substrate may be stretched and thus distorted. Once the substrate reaches the roller, the substrate distortion is fixed. By adjusting the processing parameters, the distorted substrate is processed without correcting the distortion.
Public/Granted literature
- US20160238941A1 MASKLESS LITHOGRAPHY FOR WEB BASED PROCESSING Public/Granted day:2016-08-18
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