Invention Grant
- Patent Title: Thin film transistor substrate and method for manufacturing the same
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Application No.: US15133419Application Date: 2016-04-20
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Publication No.: US10074675B2Publication Date: 2018-09-11
- Inventor: Hyunsoo Shin , Uijin Chung
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2015-0055226 20150420
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12

Abstract:
A thin film transistor substrate includes a substrate; a first thin film transistor on the substrate and including a polycrystalline semiconductor layer, a first gate electrode on the polycrystalline semiconductor layer, a first source electrode, and a first drain electrode; a second thin film transistor on the substrate and including a second gate electrode, an oxide semiconductor layer on the second gate electrode, a second source electrode, and a second drain electrode; an intermediate insulating layer on the first gate electrode and the second gate electrode and under the oxide semiconductor layer; and a dummy layer between the first source electrode and the intermediate insulating layer and between the first drain electrode and the intermediate insulating layer, wherein the dummy layer is formed of a same material as the oxide semiconductor layer.
Public/Granted literature
- US20160307936A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-10-20
Information query
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