- 专利标题: Antimicrobial denture
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申请号: US15192512申请日: 2016-06-24
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公开(公告)号: US10076471B2公开(公告)日: 2018-09-18
- 发明人: Amal M. Nawasrah
- 申请人: University of Dammam
- 申请人地址: SA Dammam
- 专利权人: University of Dammam
- 当前专利权人: University of Dammam
- 当前专利权人地址: SA Dammam
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: A61K6/083
- IPC分类号: A61K6/083 ; A61K6/00
摘要:
A denture containing a henna powder or a henna extract, each of which comes from pulverized henna leaves and may include any of lawsone, tannic acid, and 2-methoxy-1,4-napthoquinone and a denture fabrication material. A denture containing at least one first antimicrobial ingredient selected from the group consisting of henna powder or a henna extract, lawsone, tannic acid, and 2-methoxy-1,4-napthoquinone, and a second antimicrobial ingredient, and optionally, a biocompatible gel and an odor neutralizer.
公开/授权文献
- US20170367934A1 ANTIMICROBIAL DENTURE 公开/授权日:2017-12-28
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