Invention Grant
- Patent Title: Plasma processing device
-
Application No.: US15314772Application Date: 2016-01-08
-
Publication No.: US10079133B2Publication Date: 2018-09-18
- Inventor: Takahide Murayama , Yasuhiro Morikawa , Toshiyuki Sakuishi
- Applicant: ULVAC, INC.
- Applicant Address: JP Chigasaki-Shi
- Assignee: ULVAC, INC.
- Current Assignee: ULVAC, INC.
- Current Assignee Address: JP Chigasaki-Shi
- Agency: Grossman, Tucker, Perreault & Pfleger, PLLC
- Priority: JP2015-006728 20150116
- International Application: PCT/JP2016/050510 WO 20160108
- International Announcement: WO2016/114232 WO 20160721
- Main IPC: H01J17/04
- IPC: H01J17/04 ; H05H1/46 ; H05H1/38 ; H05H1/24 ; H01J37/32

Abstract:
A plasma processing device includes: a chamber; a flat-plate-shaped first electrode; a first high frequency power supply; a helical second electrode disposed outside the chamber and disposed to face the first electrode with a quartz plate forming an upper lid of the chamber therebetween; and a gas introducing unit, in which a second high frequency power supply and a third high frequency power supply are configured to be electrically connected to the second electrode, the second high frequency power supply being configured to apply an AC voltage of a second frequency to the second electrode, the third high frequency power supply being configured to apply an AC voltage of a third frequency to the second electrode, and the third frequency being higher than the second frequency; and two types of AC voltages are configured to be simultaneously applied.
Public/Granted literature
- US20170316917A1 PLASMA PROCESSING DEVICE Public/Granted day:2017-11-02
Information query