Invention Grant
- Patent Title: Formation of boron-doped titanium metal films with high work function
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Application No.: US14808979Application Date: 2015-07-24
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Publication No.: US10083836B2Publication Date: 2018-09-25
- Inventor: Robert Brennan Milligan
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Agency: Snell & Wilmer L.L.P.
- Main IPC: H01L21/285
- IPC: H01L21/285 ; H01L21/3205
Abstract:
A method for forming a Boron doped metallic film, such as Titanium Boron Nitride, is disclosed. The method allows for creation of the metallic film with a high work function and low resistivity, while limiting the increase in effective oxide thickness. The method comprises a thin metallic layer deposition step as well as a Boron-based gas pulse step. The Boron-based gas pulse deposits Boron and allows for the removal of excess halogens within the metallic film. The steps may be repeated in order to achieve a desired thickness of the metallic film.
Public/Granted literature
- US20170025280A1 FORMATION OF BORON-DOPED TITANIUM METAL FILMS WITH HIGH WORK FUNCTION Public/Granted day:2017-01-26
Information query
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