Invention Grant
- Patent Title: Optical measurement element for alignment in wafer-level testing and method for aligning an optical probe using the same
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Application No.: US15641384Application Date: 2017-07-05
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Publication No.: US10088299B2Publication Date: 2018-10-02
- Inventor: Masatoshi Tokushima
- Applicant: NEC CORPORATION , PHOTONICS ELECTRONICS TECHNOLOGY RESEARCH ASSOCIATION
- Applicant Address: JP Minato-ku, Tokyo JP Bunkyo-ku, Tokyo
- Assignee: NEC CORPORATION,PHOTONICS ELECTRONICS TECHNOLOGY RESEARCH ASSOCIATION
- Current Assignee: NEC CORPORATION,PHOTONICS ELECTRONICS TECHNOLOGY RESEARCH ASSOCIATION
- Current Assignee Address: JP Minato-ku, Tokyo JP Bunkyo-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2016-133873 20160706
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B11/14 ; G01B11/27 ; G03F9/00

Abstract:
An alignment optical measurement element includes a grating coupler, and a reflector coupled to the grating coupler. The alignment optical measurement element is arranged so that: the grating coupler diffracts an incident light in a first direction into a first diffracted light to propagate the first diffracted light as a first propagating light in a second direction, the reflector reflects the first propagating light into a second propagating light in a third direction opposite to the second direction; and the grating coupler diffracts the second propagating light into a second diffracted light to emit the second diffracted light as an emitted light in a fourth direction opposite to the first direction.
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