发明授权
- 专利标题: Thermally oxidized heterogeneous composite substrate and method for manufacturing same
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申请号: US14366125申请日: 2013-01-11
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公开(公告)号: US10103021B2公开(公告)日: 2018-10-16
- 发明人: Shoji Akiyama , Yuji Tobisaka , Kazutoshi Nagata
- 申请人: SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2012-003856 20120112
- 国际申请: PCT/JP2013/050387 WO 20130111
- 国际公布: WO2013/105634 WO 20130718
- 主分类号: H01L21/324
- IPC分类号: H01L21/324 ; H01L21/02 ; H01L21/762 ; H01L29/06 ; H01L29/786
摘要:
A thermally oxidized heterogeneous composite substrate provided with a single crystal silicon film on a handle substrate, said heterogeneous composite substrate being obtained by, prior to a thermal oxidization treatment at a temperature exceeding 850° C., conducting an intermediate heat treatment at 650-850° C. and then conducting the thermal oxidization treatment at a temperature exceeding 850° C. According to the present invention, a thermally oxidized heterogeneous composite substrate with a reduced number of defects after thermal oxidization can be obtained.
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