- 专利标题: Semiconductor device having a super junction structure
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申请号: US15461018申请日: 2017-03-16
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公开(公告)号: US10103228B2公开(公告)日: 2018-10-16
- 发明人: Yusuke Kubo
- 申请人: ROHM CO., LTD.
- 申请人地址: JP Kyoto
- 专利权人: ROHM CO., LTD.
- 当前专利权人: ROHM CO., LTD.
- 当前专利权人地址: JP Kyoto
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: JP2016-066392 20160329
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L31/00 ; H01L29/10 ; H01L29/78 ; H01L29/66 ; H01L29/739 ; H01L29/167 ; H01L21/263 ; H01L21/268
摘要:
A semiconductor device includes a semiconductor layer, having a drain region, a body region, and a source region, a gate electrode, facing the body region via a gate insulating film, a first pillar layer disposed inside the semiconductor layer so as to be continuous to the body region, and a trap level region, disposed inside the semiconductor layer and containing charged particles that form a trap level, and an electric field concentration portion, where an electric field concentrates in an off state in which a channel is not formed in the body region, and the trap level region are disposed at mutually different depth positions in a depth direction of the first pillar layer.
公开/授权文献
- US20170288021A1 SEMICONDUCTOR DEVICE 公开/授权日:2017-10-05
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