Invention Grant
- Patent Title: Metal plating compositions
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Application No.: US15559542Application Date: 2015-04-28
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Publication No.: US10106512B2Publication Date: 2018-10-23
- Inventor: Lingli Duan , Chen Chen , Shaoguang Feng , Zukhra I. Niazimbetova , Maria Anna Rzeznik
- Applicant: Dow Global Technologies LLC , Rohm and Haas Electronic Materials LLC
- Applicant Address: US MI Midland US MA Marlborough
- Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee: Dow Global Technologies LLC,Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MI Midland US MA Marlborough
- Agent John J. Piskorski
- International Application: PCT/CN2015/077682 WO 20150428
- International Announcement: WO2016/172851 WO 20161103
- Main IPC: C07D265/33
- IPC: C07D265/33 ; C09D179/08 ; C08G73/02 ; C08G73/10 ; C25D3/32 ; C25D3/38 ; C25D7/12 ; C25D7/00 ; C07D241/04 ; C07D413/12

Abstract:
Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
Public/Granted literature
- US20180093957A1 NEW METAL PLATING COMPOSITINOS Public/Granted day:2018-04-05
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