Invention Grant
- Patent Title: Group 5 transition metal-containing compounds for vapor deposition of group 5 transition metal-containing films
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Application No.: US15035592Application Date: 2013-11-13
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Publication No.: US10106887B2Publication Date: 2018-10-23
- Inventor: Clément Lansalot-Matras , Wontae Noh , Jooho Lee
- Applicant: L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , Clement Lansalot-Matras , Wontae Noh , Jooho Lee
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- International Application: PCT/KR2013/010274 WO 20131113
- International Announcement: WO2015/072589 WO 20150521
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/455 ; C01G33/00 ; C07F9/00 ; C09D5/24 ; H01L21/02 ; H01L21/285 ; C23C16/452
Abstract:
Disclosed are Group 5 transition metal-containing thin film forming precursors. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 5 transition metal-containing thin films on one or more substrates via vapor deposition processes.
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