Invention Grant
- Patent Title: Method of growing n-type nitride semiconductor, light emitting diode and method of fabricating the same
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Application No.: US14599300Application Date: 2015-01-16
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Publication No.: US10109767B2Publication Date: 2018-10-23
- Inventor: Kyung Hae Kim , Jung Whan Jung
- Applicant: Seoul Viosys Co., Ltd.
- Applicant Address: KR Ansan-si
- Assignee: Seoul Viosys Co., Ltd.
- Current Assignee: Seoul Viosys Co., Ltd.
- Current Assignee Address: KR Ansan-si
- Agency: Perkins Coie LLP
- Priority: KR10-2014-0050041 20140425; KR10-2014-0107556 20140819
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/04 ; H01L33/02

Abstract:
A light emitting diode includes: an n-type nitride semiconductor layer; an active layer over the n-type nitride semiconductor layer; and a p-type nitride semiconductor layer over the active layer. The n-type nitride semiconductor layer includes: an n-type nitride layer; a first intermediate layer over the n-type nitride layer; an n-type modulation-doped layer over the first intermediate layer. The light emitting diodes includes a second intermediate layer over the n-type modulation-doped layer. The second intermediate layer includes a sub-layer having a higher n-type doping concentration that an n-type doping concentration of the n-type modulation-doped layer.
Public/Granted literature
- US20150311382A1 METHOD OF GROWING N-TYPE NITRIDE SEMICONDUCTOR, LIGHT EMITTING DIODE AND METHOD OF FABRICATING THE SAME Public/Granted day:2015-10-29
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