- 专利标题: RF filter tuning system and method for manufacturing filter using the same
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申请号: US15175912申请日: 2016-06-07
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公开(公告)号: US10116027B2公开(公告)日: 2018-10-30
- 发明人: Nam-Shin Park , Joung-Hoe Kim , Don-Yong Lee , Kang-Hui Suh , Jong-Youn Jung , Sang-Hwan Cho , Dong-Cheon Kim , Sang-Yoong Kim , Yong-Jin Park , Oh-Kwon Kim
- 申请人: KMW INC.
- 申请人地址: KR Hwaseong, Gyeonggi-do
- 专利权人: KMW INC.
- 当前专利权人: KMW INC.
- 当前专利权人地址: KR Hwaseong, Gyeonggi-do
- 代理机构: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- 代理商 Kongsik Kim; Jhongwoo Jay Peck
- 优先权: KR10-2015-0139895 20151005
- 主分类号: H01P1/208
- IPC分类号: H01P1/208 ; H01P1/205 ; H01J3/00
摘要:
An automatic RF filter tuning system and a method for manufacturing a filter using the same are disclosed. An RF filter tuning system for tuning an RF filter that includes a plurality of cavities having resonance elements and a cover having tuning areas that are positioned correspondingly to the resonance elements, includes a measuring unit configured to measure resonance characteristics of the cavity of the RF filter, a control unit configured to calculate a tuning value of the RF filter based on the resonance characteristics, and a tuning unit configured to tune the RF filter based on the tuning value calculated by the control unit. The tuning unit includes a striking unit configured to strike the tuning area of the cover of the RF filter, thereby adjusting the resonance value and tuning the RF filter.
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