A stereolithography system comprises an emitting device and a tank disposed above the emitting device. The tank has a first optically transparent bottom wall and a second optically transparent bottom wall with a space disposed therebetween. There is a linear stage that extends away from the tank and a carrier platform is moveable along the linear stage away from the tank. There is also a wettable material at a bottom wall of the tank within the tank. A fluid cooling system is in fluid communication the space disposed between the first optically transparent bottom wall of the tank and the second optically transparent bottom wall of the tank.