A measurement apparatus includes: a first illumination unit configured to illuminate the surface with first light having a first wavelength having a light intensity distribution in a pattern shape; a second illumination unit configured to illuminate, with second light having a second wavelength, a region wider than an illumination region illuminated with the first light; an image sensing unit configured to sense an image of the surface; and a processor. The processor is configured to obtain a first image of the first wavelength and a second image of the second wavelength of the surface unit while illuminating the surface by using the first and second illumination units, correct the first image based on the second image, and obtain information of a shape of the surface by using the corrected first image.