- 专利标题: Apparatus and method for the remote monitoring, viewing and control of a semiconductor process tool
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申请号: US14202879申请日: 2014-03-10
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公开(公告)号: US10132309B2公开(公告)日: 2018-11-20
- 发明人: Donovan K. Manzarek , John C. Vines , John Laessle
- 申请人: Integrated Designs, L.P.
- 申请人地址: US TX Carrollton
- 专利权人: INTEGRATED DESIGNS, L.P.
- 当前专利权人: INTEGRATED DESIGNS, L.P.
- 当前专利权人地址: US TX Carrollton
- 代理机构: Snyder, Clark, Lesch & Chung, LLP
- 主分类号: G06F19/00
- IPC分类号: G06F19/00 ; F04B49/22 ; F04B17/03 ; F04B43/04 ; F04B53/06 ; F04B43/107 ; F04B43/067 ; F04B43/073 ; F04B35/00 ; G05B19/048 ; F04B49/10 ; F04B13/00 ; F04B43/06 ; F04B53/22 ; F04B43/113
摘要:
A precision pump system having a motor driver for accurately and repeatedly delivering process fluid, (e.g., photo chemicals) using a pumping fluid with minimal process fluid loss to a fabrication process and whereby the motor driver can be easily and quickly replaced without interrupting the fluid flow path. This is accomplished with the use of a process fluid reservoir and a pumping fluid reservoir that are associated with the pump, either integrated with the pump or closely adjacent. In addition, this precision pump system can be remotely monitored, viewed and controlled over the Internet. In addition, trapped process fluid within a downstream filtering block can be recirculated to the process fluid reservoir when trapped gas in the filter is removed. Furthermore, a nitrogen gas source is connected to the process fluid reservoir via a valve in case a need to insert a gas is required.
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