- 专利标题: Crystalline silicon ingot and method of fabricating the same
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申请号: US15070610申请日: 2016-03-15
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公开(公告)号: US10138572B2公开(公告)日: 2018-11-27
- 发明人: Sung-Lin Hsu , Cheng-Jui Yang , Pei-Kai Huang , Sheng-Hua Ni , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Ching-Shan Lin , Wen-Ching Hsu , Chung-Wen Lan
- 申请人: Sino-American Silicon Products Inc.
- 申请人地址: TW Hsinchu
- 专利权人: Sino-American Silicon Products Inc.
- 当前专利权人: Sino-American Silicon Products Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Osha Liang LLP
- 优先权: TW100137420A 20111014
- 主分类号: C01B33/02
- IPC分类号: C01B33/02 ; C30B11/00 ; C30B28/06 ; C30B29/06 ; C30B11/02 ; C30B11/14 ; C30B9/00
摘要:
A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.
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