- Patent Title: Composition for base, and directed self-assembly lithography method
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Application No.: US15595030Application Date: 2017-05-15
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Publication No.: US10146130B2Publication Date: 2018-12-04
- Inventor: Hiroyuki Komatsu , Takehiko Naruoka , Shinya Minegishi , Kaori Sakai , Tomoki Nagai
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-087752 20140421
- Main IPC: C08F2/38
- IPC: C08F2/38 ; C08F8/34 ; C08F8/40 ; C08K5/053 ; C08K5/101 ; C08K5/07 ; G03F7/038 ; G03F7/00 ; H01L21/3065 ; B05D3/06 ; H01L21/027 ; C09D125/14 ; H01L21/033 ; C09D153/00 ; G03F7/004 ; G03F7/039 ; G03F7/11 ; G03F7/16 ; G03F7/20 ; G03F7/32 ; G03F7/38 ; H01L21/311
Abstract:
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n (1)
Public/Granted literature
- US20170248847A1 COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD Public/Granted day:2017-08-31
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