- 专利标题: Method for manufacturing photo cured material
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申请号: US14391069申请日: 2013-04-23
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公开(公告)号: US10150231B2公开(公告)日: 2018-12-11
- 发明人: Toshiki Ito , Akiko Iimura
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2012-102342 20120427
- 国际申请: PCT/JP2013/062684 WO 20130423
- 国际公布: WO2013/162049 WO 20131031
- 主分类号: B29C35/08
- IPC分类号: B29C35/08 ; G03F7/00 ; H01L21/027 ; B29C59/02 ; C08F112/08 ; H05K1/18 ; H05K3/00 ; H05K3/06 ; B29K25/00 ; B29K105/00
摘要:
Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is −1.0% to 3.0%.
公开/授权文献
- US20150075855A1 METHOD FOR MANUFACTURING PHOTO CURED MATERIAL 公开/授权日:2015-03-19
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