Invention Grant
- Patent Title: Substrate processing apparatus
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Application No.: US13598431Application Date: 2012-08-29
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Publication No.: US10153182B2Publication Date: 2018-12-11
- Inventor: Noboru Higashi , Satoru Hiraki , Hiromi Kiyose , Hideaki Sato , Hiroshi Komiya
- Applicant: Noboru Higashi , Satoru Hiraki , Hiromi Kiyose , Hideaki Sato , Hiroshi Komiya
- Applicant Address: JP Kurashiki-shi JP Tokyo
- Assignee: Kurashiki Boseki Kabushiki Kaisha,Tokyo Electron Limited
- Current Assignee: Kurashiki Boseki Kabushiki Kaisha,Tokyo Electron Limited
- Current Assignee Address: JP Kurashiki-shi JP Tokyo
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP2011-189159 20110831
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/311 ; G01N21/3577

Abstract:
A substrate processing apparatus that performs processing by immersing a substrate into a processing liquid obtained by mixing phosphoric acid with a diluent includes a concentration sensing means for sensing the concentration of the processing liquid by measuring the absorbance characteristics of the processing liquid. The concentration sensing means includes a light-transmitting section that introduces the processing liquid into the inside to let the processing liquid pass therethrough, a light-emitting section that radiates light having a predetermined wavelength to the light-transmitting section, a light-receiving section that receives the light therefrom via the light-transmitting section, a first lens that condenses the light emitted from the light-emitting section to the light-transmitting section, a second lens that condenses the light that has passed through the light-transmitting section to the light-receiving section, and a cooling mechanism that cools at least one of these.
Public/Granted literature
- US20130048215A1 SUBSTRATE PROCESSING APPARATUS Public/Granted day:2013-02-28
Information query
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