Invention Grant
- Patent Title: Method of making an accelerometer
-
Application No.: US15051856Application Date: 2016-02-24
-
Publication No.: US10156583B2Publication Date: 2018-12-18
- Inventor: Qing Ma , Valluri Rao , Feras Eid , Kevin Lin , Weng Hong Teh , Johanna M. Swan , Robert L. Sankman
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H01F7/06
- IPC: H01F7/06 ; G01P15/097 ; G01P15/105 ; G01P15/18

Abstract:
A method of manufacturing an accelerometer, including placing a magnet on a substrate, laminating a dielectric layer over the magnet, forming a conductive layer over the dielectric layer, the conductive layer including a mass and a conductive path overlying the magnet, removing a portion of the dielectric layer proximate the mass and conductive path such that the mass is movable in response to acceleration of the accelerometer, and forming a dielectric layer over the mass to form a space between the mass and the dielectric layer formed over the mass sufficiently clear such that the mass remains movable.
Public/Granted literature
- US20160245841A1 ACCELEROMETER AND METHOD OF MAKING SAME Public/Granted day:2016-08-25
Information query