Invention Grant
- Patent Title: Liquid processing method and storage medium
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Application No.: US14919869Application Date: 2015-10-22
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Publication No.: US10168618B2Publication Date: 2019-01-01
- Inventor: Norihiko Sasagawa , Hiroichi Inada , Yasushi Takiguchi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP2010-195840 20100901
- Main IPC: B05D3/12
- IPC: B05D3/12 ; G03F7/16 ; H01L21/67 ; G03F7/30 ; B05D1/00 ; G06F19/00

Abstract:
A liquid processing method includes: accommodating a substrate horizontally in each of a first processing region and a second processing region, for performing therein a process on the substrate by a processing solution from a nozzle; rotating a rotary body about a vertical axis; keeping a plurality of processing nozzles provided at the rotary body; supplying different kinds of processing solutions to the substrate from the plurality of processing nozzles; holding a processing nozzle selected from the plurality of processing nozzles by a nozzle holder provided at the rotary body; transferring the nozzle holder into selected one of the first and the second processing regions by a nozzle transfer device; and rotating the rotary body by a rotation driving unit so as to allow a front of the nozzle holder in a forward/backward direction thereof to face the selected one of the first and the second processing regions.
Public/Granted literature
- US20160054653A1 LIQUID PROCESSING METHOD AND STORAGE MEDIUM Public/Granted day:2016-02-25
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